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ASML

Open 111d

D&E - Optical Proximity Correction Software Engineer - Hsinchu

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Job Mission

  • Develop algorithms for large-scale parallel lithography computational systems.
  • Cooperate deeply with customer to develop and troubleshooting OPC recipes.
  • Provide quick responses to customer’s urgent requests.

Job Details

  • Write programs (C/C++, LUA) for large-scale parallel lithography computational systems.
  • Debug program under restricted environments, and bounded time.
  • Educate and communicate with customer R&Ds.

This position requires access to controlled technology, as defined in the United States Export Administration Regulations (15 C.F.R. § 730, et seq.). Qualified candidates must be legally authorized to access such controlled technology prior to beginning work. Business demands may require ASML to proceed with candidates who are immediately eligible to access controlled technology.

Inclusion and diversity

ASML is an Equal Opportunity Employer that values and respects the importance of a diverse and inclusive workforce. It is the policy of the company to recruit, hire, train and promote persons in all job titles without regard to race, color, religion, sex, age, national origin, veteran status, disability, sexual orientation, or gender identity. We recognize that inclusion and diversity is a driving force in the success of our company.

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